Taiwan Mask prepares for leap into 0.13-micron era
To keep up with the trend toward miniaturization in Taiwan's IC industry, Taiwan Mask president Parkson Chen said on May 28 that the company is installing manufacturing equipment and developing photomasks needed for 0.13-micron processing and below. Chen stated that 0.13-micron and smaller technology would pass customer verification this year, and demand is expected to become more apparent starting next year. Photomask sales are forecast to reach 68,000 units this year, rising 10% from last year, Chen indicated.
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