Nikon ships first immersion lithography system for 55 nm chip production
Nikon Precision today said that it has shipped the world’s first production immersion lithography system. The device, named NSR-S609B, was sold to a "major IC manufacturer" and will enable the mass prodsuction of 55 nm memory products and development of 45 nm devices.
According to Nikon, the system uses a proprietary Local Fill Technology, which eliminate scanner-induced immersion defects with no bubbles, water spots, or backside wafer contamination.
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