Electron-beam projection lithography wanes

Eighteen months ago, an electron-beam projection lithography (EPL) research project launched at Bell Labs with the participation of major semiconductor tool companies. Many observers believed that electrons were on their way to replacing photons as the etching tip in the next generation of IC lithography. Lucent (Agere), Motorola, Samsung and Texas Instruments all supported the effort. Today, however, extreme-ultraviolet technology (EUV) seems to be winning industry consensus. The original EPL effort is dissolving and the extreme-ultraviolet solution coming out of EUV LLC in Livermore, California is gaining support.

Read the source article at eet.com.