Consortium unveils EUV machine
The EUV Industry Consortium has unveiled a prototype machine that uses extreme ultraviolet light to print circuits in a process similar to photography. While current technology may allow a 0.1 micron line process, EUV is expected to enable 0.03 micron chips and increase speeds up to 10 GHz by 2006. Intel Corp. and others, however, believe that the schedule can be moved up by several years.
The consortium includes Advanced Micro Devices, IBM, Infineon Technologies, Micron Technology, and Motorola as well as Lawrence Berkeley National Laboratory, Lawrence Livermore National Laboratory, and Sandia National Laboratory. While current lithography uses lenses to focus light, EUV directs high-powered lasers developed by the military off mirrors designed by astronomers to reduce chip features size.
For more, read zdnn.com, pcworld.com and siliconstrategies.com.
- consortium ,
- unveils ,
- euv ,
- machine
- Rack your Apache Xboxes?
- Microsoft promises better security with upgrades
- Intel enters auto computer biz
- Intel execs angry at MS USB 2 policy
- Judge warns of Rambus embarrassment
- Intel to cut P4 prices up to 60 percent
- HP, SGI, and Sun rush FTP security patches
- EU approves digital copyright rules
- Crypto experts laud US Gov't adoption of AES
