ASML ships volume production system for semiconductors as small as 36.5 nm

ASML claims to have shipped a lithography system capable of creating today’s smallest semiconductor structures. According to the company, the Twinscan XT:1900i system supports imaging features down to 36.5 nm on volume production chips (up to 131 wafers per hour).

ASML said that the first system has been shipped, with more to follow throughout this year. The company declined to reveal who received this first 1900i system, but mentioned that “many of the world’s leading device makers” have placed orders.